Austin, Jan. 15, 2026 (GLOBE NEWSWIRE) -- Atomic Layer Etching System Market Size & Growth Insights: According to the SNS Insider, “The Atomic Layer Etching System Market size is estimated at USD 1.36 ...
A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoSâ‚‚), a next-generation ...
Continuous downscaling of the critical dimensions in semiconductor devices is the cornerstone of technological revolution. As the technology nodes keep shrinking, innovations in fabrication ...
Silicon carbide is for photonic circuits and quantum devices. Atomic layer processing boosts SiC waveguides and resonators, improving performance.
The process comprises a surface nitrogenation step via N + ion bombardment, followed by O 2 plasma treatment to form volatile etching byproducts. This approach enables subatomic-level etching ...
LUND, Sweden, Oct. 21, 2022 /PRNewswire/ -- AlixLabs from Lund, Sweden, has developed a new, innovative method for manufacturing semiconductor components with a high degree of packing, eliminating ...
Atomic layer deposition (ALD) has emerged as a critical technique for fabricating ultrathin films with atomic-scale precision. In particular, ruthenium thin films are of great interest in the ...
In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...
(Nanowerk News) A groundbreaking plasma etching technology has been developed that promises to form the bedrock for the industrial production of molybdenum disulfide (MoS2), a next-generation ...
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